It has electrons that carry a very high amount of energy.
High energy electron beam.
The electrons strike the work piece and their kinetic energy converts into thermal energy heating the metal so that the edges of work piece are fused and joined together forming a weld after solidification.
The main body and the control system.
However in the present work we demonstrate that the exposure of pedot pss films to high energy electron beam to improve its thermoelectric properties.
High energy electron beam is mainly used for electron beam processing ebi.
The interaction volume decreases as a function of the mean atomic weight.
The electron beam e beam irradiation process uses high energy electrons for a variety of applications such as the sterilization of single use medical devices contamination control of consumer products and modification of materials such as heat shrink tubing wire and cables and molded parts.
Possible uses for electron irradiation include sterilization and cross linking of polymers.
Electron beam processing or electron irradiation ebi is a process that involves using electrons usually of high energy to treat an object for a variety of purposes.
What is electron beam irradiation.
This may take place under elevated temperatures and nitrogen atmosphere.
Trenches etched in surfaces could be filled with metals by introducing metal atoms containing.
It is a process that uses high energy electrons to treat an object for purposes like.
Rheed systems gather information only from the surface layer of the sample which distinguishes rheed from other materials characterization methods that also rely on diffraction of high energy electrons.
The high energy ebl system consists of two major components.
Using the technique high energy electron beams can produce feature sizes just a few nanometers wide.
Electron beam welding ebw is a fusion welding process utilizing a heat generated by a beam of high energy electrons.
The point beam ebl system can generate a high resolution electron beam with a large electric current on a nano ampere order that facilitates the high speed drawing of fine patterns on the substrate.
The electron beam treatment of the films was carried out with 10 mev rf accelerator by delivering dose up to 75 kgy in steps.
Treatment of aqueous solutions associated with contaminated water.
Smaller and more asymmetric interaction volumes develop in samples tilted relative to the impinging electron beam.
As with photon beams the off axis ratio oar relates the dose at any point in a plane perpendicular to the ca of the beam to the dose at the ca of the beam.